By way of advanced nano thin film fabrication techniques, we explore the frontier of nanophysics and naanotechnology in novel thin film materials and devices. Current research scope include alternaitve high k gate dielectrics for nano Si CMOS, novel high k dielectrics for III-V semiconductor passivation for future high speed electronics, spin transport and injection in dilute magnetic semiconductors for spintronics.

     The experimental techniques include molecular bean epitaxay, phyiscal vapor deposition, atomic layer deposition plus post thin film processing. We are equipped with physical measurements including semiconductor electrical parameters, low temperature magnetic transport, low temperature near field scanning magnetic optical microscopy, and in-situ surface probes of AFM, SPM, and XPS under development.